APPLICATION OF ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE TO CONDUCTIVE FILM DEPOSITION

被引：28

作者：

SHIMADA, M

ONE, T

NISHIMURA, H

MATSUO, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1995年 / 13卷 / 03期

关键词：

D O I：

10.1116/1.579833

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：815 / 819

页数：5

共 12 条

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[5] A FEW TECHNIQUES FOR PREPARING CONDUCTIVE MATERIAL FILMS FOR SPUTTERING-TYPE ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA [J].

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ONO, K .

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[7]

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[8] ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE FOR CONDUCTIVE FILM DEPOSITION [J].

ONO, T ;

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[9]

ONO T, 1986, J VAC SCI TECHNOL B, V4, P696, DOI 10.1116/1.583599

[10] ELECTRON-CYCLOTRON RESONANCE PLASMA DEPOSITION TECHNIQUE USING RAW-MATERIAL SUPPLY BY SPUTTERING [J].

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