DIFFUSION BEHAVIOR OF FLUORINE IN SILICA GLASS

被引：47

作者：

KIRCHHOF, J

UNGER, S

KLEIN, KF

KNAPPE, B

机构：

[1] INST PHYS HOCHTECHNOL,D-07702 JENA,GERMANY

[2] FACHHSCH GIESSEN FRIEDBERG,D-61169 FRIEDBERG,GERMANY

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1995年 / 181卷 / 03期

关键词：

D O I：

10.1016/S0022-3093(94)00525-7

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Fluorine diffusion has been studied between 1600 and 2000 degrees C in vapour-deposited silica layers. In particular, the influence of the common impurities hydroxyl and chlorine and the codopant phosphorous oxide was investigated. Hydroxyl and especially phosphorous enhance the fluorine diffusion rate whereas chlorine shows no detectable effect. The determined Arrhenius dependence of the diffusion coefficient agrees well with previous investigations made at lower temperatures. Additionally, diffusion coefficients for chlorine were derived.

引用

页码：266 / 273

页数：8

共 20 条

[11] REACTOR PROBLEMS IN MODIFIED CHEMICAL VAPOR-DEPOSITION .1. THE COLLAPSE OF QUARTZ GLASS TUBES [J].