ULTRAVIOLET LASER-INDUCED OXIDATION OF SILICON - THE EFFECT OF OXYGEN PHOTODISSOCIATION UPON OXIDE-GROWTH KINETICS

被引：20

作者：

ORLOWSKI, TE

MANTELL, DA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 09期

关键词：

D O I：

10.1063/1.341263

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4410 / 4414

页数：5

共 15 条

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