IMPACT IONIZATION AND LIGHT-EMISSION IN INALAS/INGAAS HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS

被引:12
作者
BERTHOLD, G
ZANONI, E
CANALI, C
PAVESI, M
PECCHINI, M
MANFREDI, M
BAHL, SR
DELALAMO, JA
机构
[1] UNIV PARMA,DIPARTIMENTO FIS,I-43100 PARMA,ITALY
[2] MIT,DEPT ELECT ENGN & COMP SCI,CAMBRIDGE,MA 02139
[3] UNIV PADUA,DIPARTIMENTO ELETTR & INFORMAT,I-35131 PADUA,ITALY
[4] UNIV MODENA,DIPARTIMENTO SCI ENGN,I-41100 MODENA,ITALY
关键词
D O I
10.1109/16.372081
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present measurements on impact ionization effects, real space transfer of holes and electrons, and light emission occurring in n-channel InAlAs/InGaAs heterostructure Field-Effect Transistors based on InP operated at high electric fields and at different temperatures. The channel electrons heated by the lateral electric field give rise to impact ionization and light emission. By comparing the electrical characteristics and the integrated light intensity in different energy ranges and at different temperatures, we were able to identify two main different light emission mechanisms: conduction to conduction-band transitions for low energy photons and conduction to valence-band transitions for high energy photons. The correlation between the gate current and the light intensity allowed us to separately evaluate the electron and hole components of the gate current.
引用
收藏
页码:752 / 759
页数:8
相关论文
共 20 条
[1]   STRAINED-INSULATOR INXAL1-XAS/N+-IN0.53GA0.47AS HETEROSTRUCTURE FIELD-EFFECT TRANSISTORS [J].
BAHL, SR ;
AZZAM, WJ ;
DELALAMO, JA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (09) :1986-1992
[2]  
BAHL SR, 1992, FOURTH INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS, P222, DOI 10.1109/ICIPRM.1992.235599
[3]   ANALYSIS OF GATE LEAKAGE ON MOVPE GROWN INALAS/INGAAS-HFET [J].
BUCHALI, F ;
HEEDT, C ;
PROST, W ;
GYURO, I ;
MESCHEDE, H ;
TEGUDE, FJ .
MICROELECTRONIC ENGINEERING, 1992, 19 (1-4) :401-404
[4]   THRESHOLDS OF IMPACT IONIZATION IN SEMICONDUCTORS [J].
BUDE, J ;
HESS, K .
JOURNAL OF APPLIED PHYSICS, 1992, 72 (08) :3554-3561
[5]   HOT-CARRIER LUMINESCENCE IN SI [J].
BUDE, J ;
SANO, N ;
YOSHII, A .
PHYSICAL REVIEW B, 1992, 45 (11) :5848-5856
[6]  
BUDE J, 1992, J APPL PHYS, V72, P3557
[7]  
CANALI C, 1993, 1992 P NATO ARW, P215
[8]  
Capasso F., 1985, SEMICONDUCTORS SEMIM, V22
[9]   IMPACT IONIZATION COEFFICIENTS FOR ELECTRONS AND HOLES IN STRAINED IN0.2GA0.8AS AND IN0.15GA0.63AL0.22AS CHANNELS EMBEDDED IN AL0.3GA0.7AS [J].
CHEN, YC ;
BHATTACHARYA, PK .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (01) :465-467
[10]   IMPACT IONIZATION IN GAAS-MESFETS [J].
HUI, K ;
HU, CM ;
GEORGE, P ;
KO, PK .
IEEE ELECTRON DEVICE LETTERS, 1990, 11 (03) :113-115