ELLIPSOMETRIC STUDY OF PLASMA OXIDATION OF TANTALUM

被引：14

作者：

LESLIE, JD

KNORR, K

机构：

[1] CTR RECH TRES BASSES TEMP,GRENOBLE,FRANCE

[2] INST VON LAUE LANGEVIN,GRENOBLE,FRANCE

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 02期

关键词：

D O I：

10.1149/1.2401794

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：263 / 267

页数：5

共 11 条

[1]

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[2]

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[7] MEASUREMEMT OF THICKNESS AND REFRACTIVE INDEX OF VERY THIN FILMS AND OPTICAL PROPERTIES OF SURFACES BY ELLIPSOMETRY [J].

MCCRACKIN, FL ;

PASSAGLIA, E ;

STROMBERG, RR ;

STEINBERG, HL .

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[8] THE FORMATION OF METAL OXIDE FILMS USING GASEOUS AND SOLID ELECTROLYTES [J].

MILES, JL ;

SMITH, PH .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) :1240-1245

[9] FACTORS AFFECTING GROWTH RATE OF PLASMA ANODIZED AL203 [J].

OHANLON, JF .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (02) :270-&

[10] PLASMA ANODIZATION OF GERMANIUM [J].

OHANLON, JF .

APPLIED PHYSICS LETTERS, 1969, 14 (04) :127-&

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