ION-IMPLANTATION OF TI INTO FE IN THE PRESENCE OF RESIDUAL AND BACKFILLED GASES

被引：8

作者：

HOFFMANN, B

BAUMANN, H

RAUCH, F

BETHGE, K

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 28卷 / 03期

关键词：

D O I：

10.1016/0168-583X(87)90173-X

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：336 / 343

页数：8

共 38 条

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[7]

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[8] SPUTTERING OF METAL TARGETS UNDER INCREASED OXYGEN PARTIAL-PRESSURE [J].

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NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 13 (1-3) :343-347

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[10]

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