IMPLANTATION AND REDISTRIBUTION OF DOPANTS AND ISOLATION SPECIES IN GAN AND RELATED-COMPOUNDS

被引:31
作者
WILSON, RG
VARTULI, CB
ABERNATHY, CR
PEARTON, SJ
ZAVADA, JM
机构
[1] UNIV FLORIDA,DEPT MAT SCI & ENGN,GAINESVILLE,FL 32611
[2] USA,RES OFF,RES TRIANGLE PK,NC 27709
关键词
D O I
10.1016/0038-1101(94)00251-A
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Twelve different elements used for doping or isolation were implanted into GaN (and selected species into AIN and InN), and the resulting range parameters were measured by secondary ion mass spectrometry. For lighter elements such as Be, F and H, the agreement between experimental range and range straggle determined using a Pearson IV computer fitting routine and those predicted by TRIM 92 calculations was good, but for heavier elements such as Ge and Se, the discrepancy can be as much as a factor of two in range. There was little redistribution of any of the investigated species up to 700 degrees C, except for H-2 in AIN and S in GaN. Elements such as F and Be, which are generally rapid diffusers in III-V compounds, do not display any redistribution in GaPZ for temperatures up to 800 degrees C.
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页码:1329 / 1333
页数:5
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