COMPOSITIONAL CONTROL OF TANTALUM-ALUMINUM ALLOY FILMS BY A DC BIASED, AC SPUTTERING TECHNIQUE

被引：8

作者：

STEIDEL, CA

JAFFE, D

KUMAGAI, HY

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 01期

关键词：

D O I：

10.1116/1.1316605

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：346 / &

共 13 条

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