PROPERTIES OF VAPOR-DEPOSITED SILICON-NITRIDE FILMS WITH VARYING EXCESS SI CONTENT

被引：16

作者：

TANABASHI, K ^{[1
]}

KOBAYASHI, K ^{[1
]}

机构：

[1] NIPPON ELECT CO LTD, IC DIV, NAKAHARA, KAWASAKI, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1973年 / 12卷 / 05期

关键词：

D O I：

10.1143/JJAP.12.641

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：641 / 646

页数：6

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