EFFECT OF STRUCTURE AND PROCESSING ON ELECTROMIGRATION-INDUCED FAILURE IN ANODIZED ALUMINUM

[1] DEPENDENCE OF ELECTROMIGRATION-INDUCED FAILURE TIME ON LENGTH AND WIDTH OF ALUMINUM THIN-FILM CONDUCTORS [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (10) : 3954 - &

[2] COATING, MECHANICAL CONSTRAINTS, AND PRESSURE EFFECTS ON ELECTROMIGRATION [J]. APPLIED PHYSICS LETTERS, 1972, 20 (04) : 173 - &

[3] REDUCTION OF ELECTROMIGRATION IN ALUMINUM FILMS BY COPPER DOPING [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (04) : 461 - +

[4] ELECTROMIGRATION DAMAGE IN ALUMINUM FILM CONDUCTORS [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (06) : 2381 - +

[5] ELECTROMIGRATION FAILURE MODES IN ALUMINUM METALLIZATION FOR SEMICONDUCTOR DEVICES [J]. PROCEEDINGS OF THE IEEE, 1969, 57 (09) : 1587 - &

[6] ELECTROMIGRATION - A BRIEF SURVEY AND SOME RECENT RESULTS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (04) : 338 - &

[7] ELECTROMIGRATION-INDUCED FAILURES IN ALUMINUM FILM CONDUCTORS [J]. APPLIED PHYSICS LETTERS, 1970, 17 (07) : 281 - &

[8] BLECH IA, 1971, 8 ANN P REL PHYS S I, P144

[9] CHHABRA D, 1967, ELECTROCHEMICAL SOCI

[10] D'Heurle F., 1970, Applied Physics Letters, V16, P80, DOI 10.1063/1.1653108

[1] DEPENDENCE OF ELECTROMIGRATION-INDUCED FAILURE TIME ON LENGTH AND WIDTH OF ALUMINUM THIN-FILM CONDUCTORS [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (10) : 3954 - &

[2] COATING, MECHANICAL CONSTRAINTS, AND PRESSURE EFFECTS ON ELECTROMIGRATION [J]. APPLIED PHYSICS LETTERS, 1972, 20 (04) : 173 - &

[3] REDUCTION OF ELECTROMIGRATION IN ALUMINUM FILMS BY COPPER DOPING [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (04) : 461 - +

[4] ELECTROMIGRATION DAMAGE IN ALUMINUM FILM CONDUCTORS [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (06) : 2381 - +

[5] ELECTROMIGRATION FAILURE MODES IN ALUMINUM METALLIZATION FOR SEMICONDUCTOR DEVICES [J]. PROCEEDINGS OF THE IEEE, 1969, 57 (09) : 1587 - &

[6] ELECTROMIGRATION - A BRIEF SURVEY AND SOME RECENT RESULTS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (04) : 338 - &

[7] ELECTROMIGRATION-INDUCED FAILURES IN ALUMINUM FILM CONDUCTORS [J]. APPLIED PHYSICS LETTERS, 1970, 17 (07) : 281 - &

[8] BLECH IA, 1971, 8 ANN P REL PHYS S I, P144

[9] CHHABRA D, 1967, ELECTROCHEMICAL SOCI

[10] D'Heurle F., 1970, Applied Physics Letters, V16, P80, DOI 10.1063/1.1653108