THE EFFECT OF AR+ SPUTTERING ON THE X-RAY PHOTOELECTRON-SPECTRA OF PLASMA-DEPOSITED SILICON-NITRIDE FILMS

被引：16

作者：

CHIANG, JN

HESS, DW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 09期

关键词：

D O I：

10.1063/1.342661

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：3430 / 3434

页数：5

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共 31 条

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