THE PHYSICS OF MACROPOROUS SILICON FORMATION

被引:81
作者
LEHMANN, V
机构
[1] Dept. ZFE, Siemens AG., D-81730 München
关键词
ELECTROCHEMISTRY; ETCHING; SILICON;
D O I
10.1016/0040-6090(94)05620-S
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Self-organizing properties are observed for pore formation on silicon electrodes during anodization in hydrofluoric acid. In contrast with a quantum size mechanism which dominates in the microporous regime, a steady state condition at the pore tip is found to be the determining factor for macropore formation. This steady state condition is characterized by a critical current density for which the reaction changes from the charge-limited transfer to the mass-transfer-limited regime. Pore arrays of a depth up to the wafer thickness and aspect ratios of 250 were etched using the equations presented in this work.
引用
收藏
页码:1 / 4
页数:4
相关论文
共 9 条
[1]   AN EXPERIMENTAL AND THEORETICAL-STUDY OF THE FORMATION AND MICROSTRUCTURE OF POROUS SILICON [J].
BEALE, MIJ ;
BENJAMIN, JD ;
UREN, MJ ;
CHEW, NG ;
CULLIS, AG .
JOURNAL OF CRYSTAL GROWTH, 1985, 73 (03) :622-636
[2]   CHARGE-EXCHANGE MECHANISM RESPONSIBLE FOR P-TYPE SILICON DISSOLUTION DURING POROUS SILICON FORMATION [J].
GASPARD, F ;
BSIESY, A ;
LIGEON, M ;
MULLER, F ;
HERINO, R .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (10) :3043-3046
[3]   FORMATION MECHANISM AND PROPERTIES OF ELECTROCHEMICALLY ETCHED TRENCHES IN N-TYPE SILICON [J].
LEHMANN, V ;
FOLL, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (02) :653-659
[4]   THE PHYSICS OF MACROPORE FORMATION IN LOW DOPED N-TYPE SILICON [J].
LEHMANN, V .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (10) :2836-2843
[5]   POROUS SILICON FORMATION - A QUANTUM WIRE EFFECT [J].
LEHMANN, V ;
GOSELE, U .
APPLIED PHYSICS LETTERS, 1991, 58 (08) :856-858
[6]   POROUS SILICON FORMATION MECHANISMS [J].
SMITH, RL ;
COLLINS, SD .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (08) :R1-R22
[8]   ELECTROPOLISHING SILICON IN HYDROFLUORIC ACID SOLUTIONS [J].
TURNER, DR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (07) :402-408
[9]   MECHANISM OF PORE FORMATION ON N-TYPE SILICON [J].
ZHANG, XG .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (12) :3750-3756