LOW-TEMPERATURE OXIDATION OF CRYSTALLINE SILICON USING EXCIMER LASER IRRADIATION

被引：16

作者：

NAYAR, V ^{[1
]}

BOYD, IW ^{[1
]}

GOODALL, FN ^{[1
]}

ARTHUR, G ^{[1
]}

机构：

[1] RUTHERFORD APPLETON LAB,DIDCOT OX11 0QX,OXON,ENGLAND

来源：

APPLIED SURFACE SCIENCE | 1989年 / 36卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90906-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：134 / 140

页数：7

共 11 条

[1] MATRIX ATOMIC LOSSES AND OXYGEN INCORPORATION UNDER RUBY-LASER IRRADIATION OF SILICON IN GASEOUS ATMOSPHERES
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DALLEROSE, LFD
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COHEN, C
SIEJKA, J
BENTINI, GG
JANNITTI, E
[J]. PHYSICAL REVIEW B, 1986, 34 (04): : 2346 - 2359
[2] BOYD IW, 1987, LASER PROCESSING THI
[3] ANALYSIS OF THE THERMAL CONTRIBUTION TO UV LASER-INDUCED OXIDATION OF SILICON AND SILICON MONOXIDE
FOGARASSY, E
UNAMUNO, S
REGOLINI, JL
FUCHS, C
[J]. PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1987, 55 (02): : 253 - 260
[4] MELTING THRESHOLD OF CRYSTALLINE AND AMORPHIZED SI IRRADIATED WITH A PULSED ARF (193 NM) EXCIMER LASER
FOULON, F
FOGARASSY, E
SLAOUI, A
FUCHS, C
UNAMUNO, S
SIFFERT, P
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (04): : 361 - 364
[5] GOODALL FN, 1988, FEB P SHORT M SER
[6] ATOMIC OXYGEN AND THE THERMAL-OXIDATION OF SILICON
HOFF, AM
RUZYLLO, J
[J]. APPLIED PHYSICS LETTERS, 1988, 52 (15) : 1264 - 1265
[7] NEW RESULTS ON LOW-TEMPERATURE THERMAL-OXIDATION OF SILICON
IRENE, EA
[J]. PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1987, 55 (02): : 131 - 145
[8] HEAT-FLOW CALCULATION OF PULSED EXCIMER ULTRAVIOLET-LASERS MELTING OF AMORPHOUS AND CRYSTALLINE SILICON SURFACES
ONG, CK
SIN, EH
TAN, HS
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1986, 3 (05) : 812 - 814
[9] SCHAFER SA, 1982, J VAC SCI TECHNOL, V21, P423
[10] THIN THERMAL OXIDE ON SILICON
TAFT, EA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (10) : 2460 - 2461

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