ELASTIC-MODULUS OF AND RESIDUAL-STRESSES IN DIAMOND FILMS

被引：25

作者：

CHIU, CC ^{[1
]}

LIOU, Y ^{[1
]}

JUANG, YD ^{[1
]}

机构：

[1] ACAD SINICA,INST PHYS,TAIPEI,TAIWAN

来源：

THIN SOLID FILMS | 1995年 / 260卷 / 01期

关键词：

COATINGS; DIAMOND; ELASTIC PROPERTIES; STRESS;

D O I：

10.1016/0040-6090(94)06457-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Diamond thin films were prepared using microwave-enhanced chemical vapor deposition techniques with different concentration ratios of CH4 to H-2 at temperatures of 800 degrees C and 900 degrees C. The elastic modulus of the films varies non-linearly with the change in the ratio of CH4 to H-2, and is not significantly affected by changes in the process temperature. Compressive and tensile residual stresses develop in the films prepared at 800 degrees C and 900 degrees C, respectively. The magnitude of the stresses is a function of the CH4/H-2 ratio. An analysis of Raman spectra reveals that the quality of the films is influenced by the CH4/H-2 ratio.

引用

页码：118 / 123

页数：6

共 19 条

[11] LOCAL STRESS MEASUREMENT IN THIN THERMAL SIO2 FILMS ON SI-SUBSTRATES [J].