CRYSTALLIZATION OF AMORPHOUS-SILICON FILMS USING A MULTISTEP THERMAL ANNEALING PROCESS

被引：21

作者：

KORIN, E ^{[1
]}

REIF, R ^{[1
]}

MIKIC, B ^{[1
]}

机构：

[1] MIT,DEPT MECH ENGN,CAMBRIDGE,MA 02139

来源：

THIN SOLID FILMS | 1988年 / 167卷 / 1-2期

关键词：

This work was partially supportedb y the U.S. National ScienceF oundation (Grant ECS-8303450a) nd a Myron M. Bantrell PostdoctoralF ellowship at the MassachusettIsn stituteo f Technology.T he authorsw ould like to thank Mr. R. Iversonf or his assistancaen d helpfuld iscussionsT.h anks also to Mr. M. Frongillo for his expertt echnicala ssistancew ith the TEM; to Dr. M. Kayden for help in preparationo f them anuscripat ndto Ms. S. Shemeshfo r typing;

D O I：

10.1016/0040-6090(88)90486-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

13

引用

收藏

页码：101 / 106

页数：6

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