LATERAL SOLID-PHASE EPITAXY OF AMORPHOUS SI FILMS ON SI SUBSTRATES WITH SIO2 PATTERNS

被引：63

作者：

ISHIWARA, H ^{[1
]}

YAMAMOTO, H ^{[1
]}

FURUKAWA, S ^{[1
]}

TAMURA, M ^{[1
]}

TOKUYAMA, T ^{[1
]}

机构：

[1] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 11期

关键词：

D O I：

10.1063/1.94217

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1028 / 1030

页数：3

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