AN EXPERIMENTAL 1.5-V 64-MB DRAM

被引:113
作者
NAKAGOME, Y
TANAKA, H
TAKEUCHI, K
KUME, E
WATANABE, Y
KAGA, T
KAWAMOTO, Y
MURAI, F
IZAWA, R
HISAMOTO, D
KISU, T
NISHIDA, T
TAKEDA, E
ITOH, K
机构
[1] HITACHI VLSI ENGN CORP LTD,KODAIRA,TOKYO 187,JAPAN
[2] HITACHI LTD,SHIKOKU BRANCH OFF,MATSUYAMA,EHIME 790,JAPAN
[3] HITACHI LTD,CTR SEMICOND DESIGN & DEV,KODAIRA,TOKYO 187,JAPAN
关键词
D O I
10.1109/4.75040
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Low-voltage circuit technologies for higher density DRAM's, as well as their application to an experimental 64-Mb DRAMA with a 1.5-V internal operating voltage, are presented. A complementary current sensing scheme is proposed to reduce data transmission delay. A speed improvement of 20 ns is achieved when utilizing a 1.5-V power supply. An accurate and speed-enhanced half-V(CC) voltage generator with a current-mirror amplifier and a tri-state buffer is proposed. With it, a response time reduction of about 1.5 decades is realized. A word-line driver with a charge-pump circuit is developed to achieve a high boost ratio. A ratio of about 1.8 is obtained from a power supply voltage as low as 1.0 V. A 1.28-mu-m2 crown-shaped stacked-capacitor (CROWN) cell is also made to ensure a sufficient storage charge and to minimize data-line interference noise. An experimental 1.5-V 64-Mb DRAM is then designed and fabricated with these technologies and 0.3-mu-m electron-beam lithography. A typical access time of 70 ns is obtained and a further reduction to 50 ns is expected based on simulation results. Thus, a high-speed performance, comparable to that of 16-Mb DRAM's, can be achieved with a typical power dissipation of 44 mW, one tenth that of 16-Mb DRAM's. This indicates that a low-voltage battery operation is a promising target for further DRAM's.
引用
收藏
页码:465 / 472
页数:8
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