FLUORINATED CHEMISTRY FOR HIGH-QUALITY, LOW HYDROGEN PLASMA-DEPOSITED SILICON-NITRIDE FILMS

被引：37

作者：

CHANG, CP

FLAMM, DL

IBBOTSON, DE

MUCHA, JA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 04期

关键词：

D O I：

10.1063/1.339645

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1406 / 1415

页数：10

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[21] JONES K, 1973, COMPREHENSIVE INORGA, P147
[22] CARS STUDY OF SIH4-NH3 REACTION PROCESS IN GLOW-DISCHARGE PLASMA
KAJIYAMA, K
SAITO, K
USUDA, K
KANO, SS
MAEDA, S
[J]. APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1985, 38 (02): : 139 - 142
[23] KNOLLE WR, IN PRESS J VAC SCI T
[24] AMORPHOUS SI-F-H SOLAR-CELLS PREPARED BY DC GLOW-DISCHARGE
KONAGAI, M
TAKAHASHI, K
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (07) : 599 - 601
[25] INFLUENCE OF HALIDES ON THE PHOTOCONDUCTIVITY, DARK CONDUCTIVITY AND PHOTO-LUMINESCENCE OF A-SI-H
KRUEHLER, WW
PLAETTNER, RD
MOELLER, M
RAUSCHER, B
STETTER, W
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 333 - 338
[26] HYDROGEN CONTENT OF PLASMA-DEPOSITED SILICON-NITRIDE
LANFORD, WA
RAND, MJ
[J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (04) : 2473 - 2477
[27] Mass Spectrometric Detection of Intermediates in Chemical Vapor Deposition of Si(3)N(4)
Lin, Sin-Shong
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (12) : 1945 - 1947
[28] PROPERTIES OF AMORPHOUS SI-F-H ALLOYS
MADAN, A
OVSHINSKY, SR
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1980, 35-6 (JAN-) : 171 - 181
[29] ELECTRICAL AND OPTICAL-PROPERTIES OF AMORPHOUS SI-F-H ALLOYS
MADAN, A
OVSHINSKY, SR
BENN, E
[J]. PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1979, 40 (04): : 259 - 277
[30] A HEAT-RESISTING NEW AMORPHOUS-SILICON
MATSUMURA, H
NAKAGOME, Y
FURUKAWA, S
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (06) : 439 - 440

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