X-RAY RESIDUAL-STRESS MEASUREMENT IN TIN, ZRN AND HFN FILMS USING THE SEEMANN-BOHLIN METHOD

被引：87

作者：

PERRY, AJ ^{[1
]}

VALVODA, V ^{[1
]}

RAFAJA, D ^{[1
]}

机构：

[1] UNIV CHARLES, CS-12116 PRAGUE 2, CZECHOSLOVAKIA

来源：

THIN SOLID FILMS | 1992年 / 214卷 / 02期

关键词：

D O I：

10.1016/0040-6090(92)90766-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The equation for the effect of stress on the lattice parameters returned by the Seemann-Bohlin fine focus goniometer is generalized for cubic crystals to include the effect of the X-ray elastic constants (XECs) of the individual crystal planes. Using the equation, the analysis of data taken from some group IVB nitride films, TiN, ZrN and HfN, indicates that the residual stress derived when taking the XECs into account can be higher by as much as 20% in the case of ZrN. The analysis also returned values for the bulk Poisson's ratio for all the films which are in good agreement with an earlier study. The study appears to indicate that the grazing angle of incidence in the Seemann-Bohlin method should not be set too low or the results can be affected by the native oxygen-containing layer on the sample surface.

引用

页码：169 / 174

页数：6

共 18 条

[1]

BEHNKEN H, 1986, Z METALLKD, V77, P620

[2]

Bohlin H, 1920, ANN PHYS-BERLIN, V61, P421

[3] LOW-TEMPERATURE OXIDATION BEHAVIOR OF REACTIVELY SPUTTERED TIN BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND CONTACT RESISTANCE MEASUREMENTS [J].