SPATIAL PROFILES OF REACTIVE INTERMEDIATES IN RF SILANE DISCHARGES

被引：56

作者：

MATARAS, D

CAVADIAS, S

RAPAKOULIAS, D

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 01期

关键词：

D O I：

10.1063/1.343915

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：119 / 124

页数：6

共 26 条

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