SELF-DIFFUSION OF SILICON IN POLYCRYSTALLINE PD2SI IN THE ABSENCE OF GROWTH

被引:8
作者
EGAN, JM [1 ]
COMRIE, CM [1 ]
机构
[1] UNIV CAPE TOWN,DEPT PHYS,RONDEBOSCH 7700,SOUTH AFRICA
来源
PHYSICAL REVIEW B | 1989年 / 40卷 / 17期
关键词
D O I
10.1103/PhysRevB.40.11670
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:11670 / 11675
页数:6
相关论文
共 17 条
[1]   GRAIN-BOUNDARY DIFFUSION OF GOLD IN COPPER [J].
AUSTIN, AE ;
RICHARD, NA .
JOURNAL OF APPLIED PHYSICS, 1962, 33 (12) :3569-&
[2]   SELF-DIFFUSION OF SILICON IN THIN-FILMS OF COBALT, NICKEL, PALLADIUM AND PLATINUM SILICIDES [J].
BOTHA, AP ;
KRITZINGER, S ;
PRETORIUS, R .
THIN SOLID FILMS, 1986, 141 (01) :41-51
[3]  
CHEUNG N, 1980, P S THIN FILM INTERF, V80
[4]   DIFFUSION OF SILICON IN PD2SI DURING SILICIDE FORMATION [J].
COMRIE, CM ;
EGAN, JM .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (03) :1173-1177
[5]   KINETICS OF PD2SI LAYER GROWTH MEASURED BY AN X-RAY-DIFFRACTION TECHNIQUE [J].
COULMAN, B ;
CHEN, H .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (10) :3467-3474
[7]   GRAIN-BOUNDARY DIFFUSION IN THIN-FILMS .2. MULTIPLE GRAIN-BOUNDARIES AND SURFACE-DIFFUSION [J].
GILMER, GH ;
FARRELL, HH .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (10) :4373-4380
[8]  
GILMER GH, 1976, J APPL PHYS, V46, P3792
[9]   AN INERT MARKER STUDY FOR PALLADIUM SILICIDE FORMATION - SI MOVES IN POLYCRYSTALLINE PD2SI [J].
HO, KT ;
LIEN, CD ;
SHRETER, U ;
NICOLET, MA .
JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) :227-231
[10]   MARKER EXPERIMENTS IN GROWTH-STUDIES OF NI2SI, PD2SI, AND CRSI2 FORMED BOTH BY THERMAL ANNEALING AND BY ION MIXING [J].
HUNG, LS ;
MAYER, JW ;
PAI, CS ;
LAU, SS .
JOURNAL OF APPLIED PHYSICS, 1985, 58 (04) :1527-1536