Atmospheric-pressure chemical vapor deposition of group IVb metal phosphide thin films from tetrakisdimethylamidometal complexes and cyclohexylphosphine

被引：18

作者：

Blackman, CS

Carmalt, CJ

O'Neill, SA

Parkin, IP

Apostolico, L

Molloy, KC

机构：

[1] UCL, Dept Chem, London WC1H 0AJ, England

[2] Univ Bath, Dept Chem, Bath BA2 7AY, Avon, England

来源：

CHEMISTRY OF MATERIALS | 2004年 / 16卷 / 06期

关键词：

D O I：

10.1021/cm031161f

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The dual-source atmospheric-pressure chemical vapor deposition of group IVb metal phosphide films from tetrakisdimethylamido(metal) and cyclohexylphosphine precursors is presented. Deposition took place at low temperatures (<500 degreesC), and nitrogen and carbon contamination of the films was negligible. The films had typical stoichiometric metal phosphide properties of high electrical conductivity, hardness, and chemical resistivity.

引用

收藏

页码：1120 / 1125

页数：6

相关论文

共 29 条

[1]

BAILER JC, 1973, COMPREHENSIVE INORGA, V2, P233

[2] Titanium phosphide coatings from the atmospheric pressure chemical vapor deposition of TiCl4 and RPH2 (R = t-Bu, Ph, CyHex) [J].

Blackman, C ;

Carmalt, CJ ;

Parkin, IP ;

O'Neill, S ;

Apostolico, L ;

Molloy, KC ;

Rushworth, S .

CHEMISTRY OF MATERIALS, 2002, 14 (07) :3167-3173

[3] Dual-source atmospheric pressure CVD of amorphous molybdenum phosphide films on glass using molybdenum(v) chloride and cyclohexylphosphine [J].

Blackman, CS ;

Carmalt, CJ ;

Manning, TD ;

O'Neill, SA ;

Parkin, IP ;

Apostolico, L ;

Molloy, KC .

CHEMICAL VAPOR DEPOSITION, 2003, 9 (01) :10-+

[4] Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine [J].

Blackman, CS ;

Carmalt, CJ ;

O'Neill, SA ;

Parkin, IP ;

Apostolico, L ;

Moloy, KC .

APPLIED SURFACE SCIENCE, 2003, 211 (1-4) :2-5

[5] Chemical vapour deposition of group Vb metal phosphide thin films [J].

Blackman, CS ;

Carmalt, CJ ;

O'Neill, SA ;

Parkin, IP ;

Molloy, KC ;

Apostolico, L .

JOURNAL OF MATERIALS CHEMISTRY, 2003, 13 (08) :1930-1935

[6] Chemical vapour deposition of crystalline thin films of tantalum phosphide [J].

Blackman, CS ;

Carmalt, CJ ;

Parkin, IP ;

O'Neill, SA ;

Molloy, KC ;

Apostolico, L .

MATERIALS LETTERS, 2003, 57 (18) :2634-2636

[7] Single-source CVD routes to titanium phosphide [J].

Blackman, CS ;

Carmalt, CJ ;

Parkin, IP ;

Apostolico, L ;

Molloy, KC ;

White, AJP ;

Williams, DJ .

JOURNAL OF THE CHEMICAL SOCIETY-DALTON TRANSACTIONS, 2002, (13) :2702-2709

[8]

BLACKMAN CS, UNPUB

[9] Efficient synthesis of chiral ansa-metallocenes by amine elimination. Synthesis, structure, and reactivity of rac-(EBI)Zr(NMe(2))(2) [J].

Diamond, GM ;

Jordan, RF ;

Petersen, JL .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1996, 118 (34) :8024-8033

[10] CHEMICAL VAPOR-DEPOSITION OF TITANIUM, ZIRCONIUM, AND HAFNIUM NITRIDE THIN-FILMS [J].

FIX, R ;

GORDON, RG ;

HOFFMAN, DM .

CHEMISTRY OF MATERIALS, 1991, 3 (06) :1138-1148