Superconducting material diagnostics using a scanning near-field microwave microscope

被引：15

作者：

Anlage, SM ^{[1
]}

Steinhauer, DE ^{[1
]}

Vlahacos, CP ^{[1
]}

Feenstra, BJ ^{[1
]}

Thanawalla, AS ^{[1
]}

Hu, WS ^{[1
]}

Dutta, SK ^{[1
]}

Wellstood, FC ^{[1
]}

机构：

[1] Univ Maryland, Dept Phys, Ctr Superconduct Res, College Pk, MD 20742 USA

来源：

IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1999年 / 9卷 / 02期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1109/77.783934

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have developed scanning near-field microwave microscopes which can image electrodynamic properties of superconducting materials on length scales down to about 2 mu m. The microscopes are capable of quantitative imaging of sheet resistance of thin films, and surface topography. We demonstrate the utility of the microscopes through images of the sheet resistance of a YBa2Cu3O7.delta thin film wafer, images of bulk Nb surfaces, and spatially resolved measurements of T-c of a YBa2Cu3O7.delta thin film. We also discuss some of the limitations of the microscope and conclude with a summary of its present capabilities.

引用

页码：4127 / 4132

页数：6

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