Ion beam effects on the surface and on the bulk of thin films of polymethylmethacrylate

被引:41
作者
Licciardello, A [1 ]
Fragala, ME [1 ]
Foti, G [1 ]
Compagnini, G [1 ]
Puglisi, O [1 ]
机构
[1] UNIV CATANIA,DIPARTMENTO FIS,I-95128 CATANIA,ITALY
关键词
D O I
10.1016/0168-583X(96)00029-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Poly(methyl methacrylate) (PMMA) is a prototype polymer for positive resist (scission rate higher than cross linking rate). Notwithstanding its importance the literature studies on the chemical effects induced by energetic beam irradiation on this polymer are relatively scarce. The interest for PMMA is considerable also because it has been reported in literature that beyond a given threshold fluence (that in turn depends on the ion) the resist turns negative: i.e. the cross linking rate becomes higher than the scission rate. No explanation has been reported till now in literature for this behaviour. In this paper we report a study on the molecular weight distribution (MWD) of thin PMMA films irradiated with energetic beams. In addition we have also performed a study of the effects induced by the bombardment on the surface of the polymer by using the XPS (X-ray photoelectron spectroscopy) technique. The main results are: i) There is a strong evidence of contemporary scission and cross linking events. The first ones predominate at low fluences, the second ones at high fluences. ii) While at low fluence there is a good agreement between the experimental results and a simple equation based on random scission model, with increasing fluence one observes larger and larger deviations from this equation. These results will be discussed and compared with the existing literature reports.
引用
收藏
页码:168 / 172
页数:5
相关论文
共 15 条
[1]   ION-BOMBARDMENT OF RESISTS [J].
ADESIDA, I .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 209 (MAY) :79-86
[2]   RESIST EXPOSURE WITH LIGHT-IONS [J].
ADESIDA, I ;
ANDERSON, C ;
WOLF, ED .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1182-1185
[3]   ULTRALOW DOSE EFFECTS IN ION-BEAM INDUCED GRAFTING OF POLYMETHYLMETHACRYLATE (PMMA) [J].
CORELLI, JC ;
STECKL, AJ ;
PULVER, D ;
RANDALL, JN .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 19-20 :1009-1012
[4]   HYDROGENATED CARBON LAYERS PRODUCED BY ION-BEAM IRRADIATION OF PMMA AND POLYSTYRENE FILMS [J].
DAVENAS, J ;
THEVENARD, P ;
BOITEUX, G ;
FALLAVIER, M ;
LU, XL .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1990, 46 (1-4) :317-323
[5]   RELATION BETWEEN STRUCTURE AND ELECTRONIC-PROPERTIES OF ION IRRADIATED POLYMERS [J].
DAVENAS, J ;
XU, XL ;
BOITEUX, G ;
SAGE, D .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 39 (1-4) :754-763
[6]   FAST-NEUTRON IRRADIATION EFFECTS ON POLYMERS .1. DEGRADATION OF POLY(METHYL METHACRYLATE) [J].
EGUSA, S ;
ISHIGURE, K ;
TABATA, Y .
MACROMOLECULES, 1979, 12 (05) :939-944
[7]   CHEMICAL MODIFICATION OF PMMA BY MEV AND GEV, LIGHT AND HEAVY, ION IRRADIATIONS [J].
FINK, D ;
CHADDERTON, LT ;
HOSOI, F ;
OMICHI, H ;
SASUGA, T ;
SCHMOLDT, A ;
WANG, L ;
KLETT, R ;
HILLENBRAND, J .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1994, 91 (1-4) :146-150
[8]   PARAMETERS AFFECTING ELECTRON-BEAM SENSITIVITY OF POLY(METHYL METHACRYLATE) [J].
GIPSTEIN, E ;
OUANO, AC ;
JOHNSON, DE ;
NEED, OU .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (02) :143-153
[9]   ION-BEAM EXPOSURE CHARACTERISTICS OF RESISTS - EXPERIMENTAL RESULTS [J].
HALL, TM ;
WAGNER, A ;
THOMPSON, LF .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (06) :3997-4010
[10]  
HATZAKIS M, 1974, 6TH P INT C EL ION B, P542