RESIST EXPOSURE WITH LIGHT-IONS

被引：23

作者：

ADESIDA, I ^{[1
]}

ANDERSON, C ^{[1
]}

WOLF, ED ^{[1
]}

机构：

[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582757

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1182 / 1185

页数：4

共 10 条

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[9] ION-BEAM EXPOSURE OF RESIST MATERIALS [J].

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