Dislocation motion in GaN light-emitting devices and its effect on device lifetime

被引:117
作者
Sugiura, L
机构
[1] Mat. and Devices Res. Laboratories, R. and D. Center, Toshiba Corporation, Saiwai-ku, Kawasaki 210, 1, Komukai Toshiba-cho
关键词
D O I
10.1063/1.364018
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, dislocation motions in GaN-based materials and devices were quantitatively estimated in order to determine why GaN-based light-emitting diodes have remarkable reliability and longevity in spite of extremely high dislocation density. The dislocation velocity of GaN-based materials was calculated by estimating the activation energy of dislocation, and comparing it with that of GaAs, which are typically used for light-emitting devices. It was estimated that the dislocation mobility of GaN-related materials was lower than that of GaAs by a factor of approximately 10(-10)-10(-16), at room temperature. Furthermore, dislocation velocity under current injection became about 10(-20) times lower than that of GaAs, under the assumption that the dislocations in GaN-related materials do not act as nonradiative recombination centers. The possibility of degradation under high current densities and high temperature, as would be found in GaN-based laser diodes, is also discussed. (C) 1997 American Institute of Physics.
引用
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页码:1633 / 1638
页数:6
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