CMOS integrated microsystems and nanosystems

被引：3

作者：

Baltes, H ^{[1
]}

Brand, O ^{[1
]}

机构：

[1] Swiss Fed Inst Technol, Phys Elect Lab, CH-8093 Zurich, Switzerland

来源：

SMART STRUCTURES AND MATERIALS 1999: SMART ELECTRONICS AND MEMS | 1999年 / 3673卷

关键词：

CMOS; microsystem; nanosystem; infrared radiation sensor; chemical sensor; AFM;

D O I：

10.1117/12.354257

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We review selected micro- and nano-systems developed recently at the Physical Electronics Laboratory of ETH Zurich using industrial CMOS technology in combination with post-processing micromachining and film deposition: (i) an infrared sensor microsystem for presence detection of persons, (ii) calorimetric, capacitive, and gravimetric chemical sensor microsystems far detection of volatile organic compounds in air, and (iii) a parallel scanning AFM chip. The microsystems combine sensor structures and read-out circuitry on a single chip.

引用

页码：2 / 10

页数：9

共 15 条

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