Origin of nitrogen-pair luminescence in GaAs studied by nitrogen atomic-layer-doping in MOVPE

被引:39
作者
Makimoto, T
Saito, H
Kobayashi, N
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1997年 / 36卷 / 3B期
关键词
atomic-layer doping; delta-doping; MOVPE; GaAs; (001); photoluminescence; isoelectronic traps; N pair; dimethylhydrazine;
D O I
10.1143/JJAP.36.1694
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nitrogen atomic-layer-doping and nitrogen uniform doping were performed on (001) GaAs by metalorganic vapor phase epitaxy using dimethylhydrazine as a nitrogen doping source. Nitrogen doped GaAs layers showed several sharp photoluminescence lines relating to excitons bound to nitrogen pairs at 8 K. We investigated the origins of these sharp photoluminescence lines, that is, the distance between the nitrogen atoms of a pair and their pairing direction. The photoluminescence spectra for nitrogen atomic-layer-doped GaAs are different from those for uniformly nitrogen-doped GaAs, as expected from the different dimensions of the nitrogen atom distribution. To estimate the distance between the nitrogen atoms of a pair and their pairing direction, we performed double atomic-layer doping and varied the distance between the two atomic-layer-doped planes. When the two planes are brought to 1 nm of each other, lines observed only in uniformly doped GaAs appear. From this result, it was determined that the pairing directions corresponding to these lines are not included in the (001) plane and the corresponding distance between the nitrogen atoms of a pair is around 1 nm.
引用
收藏
页码:1694 / 1697
页数:4
相关论文
共 10 条
[1]  
KUNZEL H, 1980, APPL PHYS LETT, V37, P416, DOI 10.1063/1.91927
[2]   SHARP PHOTOLUMINESCENCE LINES FROM NITROGEN ATOMIC-LAYER-DOPED GAAS [J].
MAKIMOTO, T ;
KOBAYASHI, N .
APPLIED PHYSICS LETTERS, 1995, 67 (05) :688-690
[3]   Extremely strong and sharp photoluminescence lines from nitrogen atomic-layer-doped GaAs, AlGaAs and AlGaAS/GaAs single quantum wells [J].
Makimoto, T ;
Kobayashi, N .
JOURNAL OF ELECTRONIC MATERIALS, 1996, 25 (09) :1527-1530
[4]   Extremely sharp photoluminescence lines from nitrogen atomic-layer-doped AlGaAs/GaAs single quantum wells [J].
Makimoto, T ;
Kobayashi, N .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (2B) :1299-1301
[5]   NITRIDATION OF GAAS-SURFACES USING NITROGEN THROUGH A HOT TUNGSTEN FILAMENT [J].
MAKIMOTO, T ;
KOBAYASHI, N .
APPLIED PHYSICS LETTERS, 1995, 67 (04) :548-550
[6]   INTERMEDIATE RANGE BETWEEN N-DOPED GAP AND GAP1-XNX ALLOYS - DIFFERENCE IN OPTICAL-PROPERTIES [J].
MIYOSHI, S ;
YAGUCHI, H ;
ONABE, K ;
ITO, R ;
SHIRAKI, Y .
JOURNAL OF CRYSTAL GROWTH, 1994, 145 (1-4) :87-92
[7]  
SAITO H, 1996, IN PRESS J CRYST GRO
[8]   ZEEMAN SPECTROSCOPY OF THE DEFECT-INDUCED BOUND-EXCITON LINES IN GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
SKOLNICK, MS ;
HALLIDAY, DP ;
TU, CW .
PHYSICAL REVIEW B, 1988, 38 (06) :4165-4179
[9]   ISOELECTRONIC TRAPS DUE TO NITROGEN IN GALLIUM PHOSPHIDE [J].
THOMAS, DG ;
HOPFIELD, JJ .
PHYSICAL REVIEW, 1966, 150 (02) :680-&
[10]  
WIESNER PJ, 1975, PHYS REV LETT, V35, P1366, DOI 10.1103/PhysRevLett.35.1366