AlGaN/GaN HEMTs on silicon substrates with fT of 32/20 GHz and fmax of 27/22 GHz for 0.5/0.7 μm gate length

被引:18
作者
Javorka, P [1 ]
Alam, A
Fox, A
Marso, M
Heuken, M
Kordos, P
机构
[1] Res Ctr Julich, Inst Thin Films & Interfaces, D-52425 Julich, Germany
[2] AIXTRON AG, D-52072 Aachen, Germany
关键词
D O I
10.1049/el:20020203
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
AlGaN/GaN HEMTs on silicon substrates babe been realised and their static and small signal characteristics investigated, The AlGaN/GaN (x=0.23) material structures were grown on (111) p-Si by LP-MOVPE. Devices exhibit a saturation current density of 0.53 to 0.68 A/mm and a peak extrinsic transconductance of 110 mS/mm. A unity gain frequency of 20 and 32 GHz and a maximum frequency of oscillation of 22 and 27 GHz are obtained for devices with a gate length of 0.7 and 0.5 mum, respectively, These values are the highest reported so far on AlGaN/GaN/Si HEMTs and are comparable to those known for de ices using sapphire and SiC substrates.
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页码:288 / 289
页数:2
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