Stress, mechanical and adhesion properties of multilayer tetrahedral amorphous carbon films

被引：22

作者：

Han, Xiao ^{[1
]}

Zhu, Jiaqi ^{[1
]}

Han, Jiecai ^{[1
]}

Tan, Manlin ^{[1
]}

Jia, Zecun ^{[1
]}

Jiang, Chunzhu ^{[1
]}

机构：

[1] Harbin Inst Technol, Ctr Composit Mat, Harbin 150080, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2008年 / 255卷 / 02期

关键词：

Amorphous materials; Thin films; Gradient coatings; Residual stresses; Mechanical properties;

D O I：

10.1016/j.apsusc.2008.06.087

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

To reduce the stress of tetrahedral amorphous carbon (ta-C) films and improve the adhesion, a graded multilayer film was deposited using a filter cathodic vacuum arc (FCVA) deposition system. Nanoindentation measurement revealed the high hardness and Young's modulus of the multilayer films. Nanoscratch test was used to estimate the scratching resistance of the multilayer films on Si substrate. The high critical scratch load implied the good cohesive and adhesive strengths of the graded multilayer films. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：607 / 609

页数：3

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