The effect of bottom electrode on the performance of thin film based capacitors in the gigahertz region

被引:50
作者
Dube, DC [1 ]
Baborowski, J
Muralt, P
Setter, N
机构
[1] Swiss Fed Inst Technol, Lab Ceram, CH-1015 Lausanne, Switzerland
[2] Indian Inst Technol, Dept Phys, New Delhi 110016, India
关键词
D O I
10.1063/1.124156
中图分类号
O59 [应用物理学];
学科分类号
摘要
Capacitors in metal-insulator-metal structure have been fabricated with different bottom electrodes. It has been found that the observed losses are enormous at gigahertz frequencies unless due care is taken not only for the conductivity of the bottom electrode but also its thickness. Very thin bottom electrodes (thickness similar to 100 nm) modify the dielectric response substantially and major loss contributions arise from the substrate, the electrode resistance, and the contacts. A simple approach is suggested to model and experimentally evaluate the electrode resistance. (C) 1999 American Institute of Physics. [S0003-6951(99)00723-8].
引用
收藏
页码:3546 / 3548
页数:3
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