Room-temperature nanoimprint lithography using photosensitive dry film

A photosensitive dry film has been proposed for the first time as the replication material for room-temperature nanoimprint lithography (RT-NIL) and UV curing. Lamination was applied to the formation of a photosensitive dry resin, as a substitute method of spin coating. It produces a homogeneous dry resin on the poly(ethylene terephthalate) (PET) used as the base sheet. UV curing is also needed to maintain imprinted patterns. We have successfully fabricated a dry film with line-and-spacing gratings of 150 nm and nanoscale patterns of a 30 nm linewidth by RT-NIL and UV curing. Furthermore, using RT-NIL, we have successfully obtained dry film patterns 60 x 100 mm(2) in size.