High sensitivity 2.5 mu m photodiodes with metastable GaInAsSb absorbing layer

被引:4
作者
Mebarki, M [1 ]
AitKaci, H [1 ]
Lazzari, JL [1 ]
SeguraFouillant, C [1 ]
Joullie, A [1 ]
Llinares, C [1 ]
Salesse, I [1 ]
机构
[1] UNIV MONTPELLIER 2, CTR ELECTR MONTPELLIER, CNRS, URA 391, F-34095 MONTPELLIER 5, FRANCE
关键词
D O I
10.1016/0038-1101(95)00104-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Al-0.35 Ga-0.65 As-0.03 Sb-0.97 (p(+))/Ga-0.74 In-0.26 As-0.23 Sb-0.77 (p)/GaSb (n(+)) photodiodes with a long-wavelength cutoff of 2.5 mu m have been fabricated on GaSb (111)B substrates. The active GaInAsSb layer was grown by liquid phase epitaxy inside the metastable region of the alloy. These devices without any passivation or antireflection coating exhibit a reverse current of 35 mA/cm(2) (at -1 V) and an external quantum efficiency higher than 40% in the wavelength range 1.3-2.3 mu m with a peak value of 52% at 2.1 mu m.
引用
收藏
页码:39 / 41
页数:3
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