Formation of two-dimensional electron and hole gases in undoped AlxGa1-xAs/GaAs heterostructures

被引:15
作者
Hirayama, Y
机构
[1] NTT Basic Research Laboratories, Atsugi-Shi, Kanagawa, 243-01
关键词
D O I
10.1063/1.362722
中图分类号
O59 [应用物理学];
学科分类号
摘要
Two-dimensional electron or hole gases (2DEG or 2DHG) are confined at the same interface in an undoped heterostructure by an electric field generated by a top gate. The combination of ion-implanted ohmic regions, an undoped heterostructure with superlattice barriers, and a metal gate is used to fabricate structures by a conventional process without self-alignment. High-quality 2DEG and 2DHG with a carrier density up to 8X10(11) cm(-2) are formed with a small gate leakage current. Switching between 2DEG and 2DHG at the same heterointerface is achieved by changing the sign of the gate voltage. (C) 1996 American Institute of Physics.
引用
收藏
页码:588 / 590
页数:3
相关论文
共 15 条
[1]  
Cirillo N. C. Jr., 1985, International Electron Devices Meeting. Technical Digest (Cat. No. 85CH2252-5), P317
[2]   DEVICE CHARACTERIZATION OF P-CHANNEL ALGAAS/GAAS MIS-LIKE HETEROSTRUCTURE FETS [J].
HIRANO, M ;
OE, K ;
YANAGAWA, F ;
TSUBAKI, K .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (12) :2399-2404
[3]   HIGH-MOBILITY GAAS HETEROSTRUCTURE FIELD-EFFECT TRANSISTOR FOR NANOFABRICATION IN WHICH DOPANT-INDUCED DISORDER IS ELIMINATED [J].
KANE, BE ;
PFEIFFER, LN ;
WEST, KW .
APPLIED PHYSICS LETTERS, 1995, 67 (09) :1262-1264
[4]   VARIABLE-DENSITY HIGH-MOBILITY 2-DIMENSIONAL ELECTRON AND HOLE GASES IN A GATED GAAS/ALXGA1-XAS HETEROSTRUCTURE [J].
KANE, BE ;
PFEIFFER, LN ;
WEST, KW ;
HARNETT, CK .
APPLIED PHYSICS LETTERS, 1993, 63 (15) :2132-2134
[5]   SEPARATELY CONTACTED ELECTRON-HOLE DOUBLE-LAYER IN A GAAS/ALXGA1-XAS HETEROSTRUCTURE [J].
KANE, BE ;
EISENSTEIN, JP ;
WEGSCHEIDER, W ;
PFEIFFER, LN ;
WEST, KW .
APPLIED PHYSICS LETTERS, 1994, 65 (25) :3266-3268
[6]   HETEROJUNCTION FETS IN III-V COMPOUNDS [J].
KIEHL, RA ;
SOLOMON, PM ;
FRANK, DJ .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1990, 34 (04) :506-529
[7]   N+-GAAS UNDOPED GAALAS UNDOPED GAAS FIELD-EFFECT TRANSISTOR [J].
MATSUMOTO, K ;
OGURA, M ;
WADA, T ;
HASHIZUME, N ;
YAO, T ;
HAYASHI, Y .
ELECTRONICS LETTERS, 1984, 20 (11) :462-463
[8]  
MIZUTANI T, 1986, P 1986 IEEE GALL ARS, P107
[9]  
SHECVHENKO SI, 1994, PHYS REV LETT, V72, P3242
[10]   COUPLED ELECTRON-HOLE TRANSPORT [J].
SIVAN, U ;
SOLOMON, PM ;
SHTRIKMAN, H .
PHYSICAL REVIEW LETTERS, 1992, 68 (08) :1196-1199