共 11 条
[1]
Feature integrity monitoring for process control using a CD SEM
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV,
2000, 3998
:227-231
[2]
Towards a unified advanced CD-SEM specification for sub-0.18 μm technology
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XII,
1998, 3332
:138-150
[3]
The importance of measurement accuracy in statistical process control
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV,
2000, 3998
:546-554
[4]
Banke B, 1999, P SOC PHOTO-OPT INS, V3677, P291, DOI 10.1117/12.350818
[5]
Automated process control monitor for 0.18 μm technology and beyond
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV,
2000, 3998
:218-226
[6]
Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18 micrometer lithography
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV,
2000, 3998
:12-27
[7]
ENGELEN A, COMMUNICATION
[8]
Mandel J., 1964, The Statistical Analysis of Experimental Data
[9]
Dimensional metrology system of shape and scale in pattern transfer
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV,
2000, 3998
:206-217
[10]
Approach to CD SEM metrology utilizing the full waveform signal
[J].
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XII,
1998, 3332
:51-60