Preparation of various DLC films by T-shaped filtered arc deposition and the effect of heat treatment on film properties

被引:59
作者
Kamiya, Masao [1 ,2 ]
Tanoue, Hideto [1 ]
Takikawa, Hirofumi [1 ]
Taki, Makoto [3 ]
Hasegawa, Yushi [3 ]
Kumagai, Masao [4 ]
机构
[1] Toyohashi Univ Technol, Dept Elect & Elect Engn, Aichi 4418580, Japan
[2] Itoh Opt Ind Co Ltd, Dev Technol Dept, Aichi 4430041, Japan
[3] Onward Ceram Coating Co Ltd, Off Res & Dev, Nomi, Ishikawa 9290111, Japan
[4] Kanagawa Ind Technol Res Ctr, Mat Technol Div, Ebina, Kanagawa 2430435, Japan
基金
日本学术振兴会; 日本科学技术振兴机构;
关键词
T-shape filtered arc deposition (T-FAD); Various diamond-like carbon (DLC); Tetrahedral amorphous carbon (ta-C); Heat resistance;
D O I
10.1016/j.vacuum.2008.04.016
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Different types of diamond-like carbon (DLC) films (ta-C, a-C, ta-C:H and a-C:H) were prepared on super hard alloy (WC-Co) substrate using a T-shape filtered arc deposition (T-FAD) system. At first, the film properties, such as structure, hydrogen content, density, hardness, elastic modulus, were measured. Ta-C prepared with a DC bias of - 100 V showed the highest density (3.1 g/cm(3)) and hardness (70-80 GPa), and the lowest hydrogen content (less than 0.1 at. %). It was found that the hardness of the DLC film is proportional to approximately the third power of film density. The DLC films were then heated for 60 min in an electric furnace at 550 degrees C in N-2. Only the ta-C film hardly change its structure, although other films were graphitized. The 200-nm thick ta-C film was then heated for 60 min through the temperature range from 400 to 800 degrees C in N-2 with 2 vol.% of O-2 and the film structure found to be stable up to 700 degrees C. The substrate was oxidized at 800 degrees C, indicating the ta-C film had a thermal barrier function up to that temperature. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:510 / 514
页数:5
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