共 9 条
[1]
BABIN S, 1998, SPIE, V3236, P464
[3]
CUI Z, 1998, SPIE, V3331
[5]
Three-dimensional electron beam lithography simulation
[J].
EMERGING LITHOGRAPHIC TECHNOLOGIES,
1997, 3048
:76-88
[7]
POINT EXPOSURE DISTRIBUTION MEASUREMENTS FOR PROXIMITY CORRECTION IN ELECTRON-BEAM LITHOGRAPHY ON A SUB-100 NM SCALE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1987, 5 (01)
:135-141
[8]
SELID: A new 3D simulator for E-beam lithography
[J].
16TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT,
1996, 2884
:435-441
[9]
A STATISTICALLY BASED MODEL OF ELECTRON-BEAM EXPOSED, CHEMICALLY AMPLIFIED NEGATIVE RESIST
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1991, 9 (06)
:3362-3369