Kinetic model for a step edge in epitaxial growth

被引：64

作者：

Caflisch, RE ^{[1
]}

Weinan, E

Gyure, MF

Merriman, B

Ratsch, C

机构：

[1] Univ Calif Los Angeles, Dept Math, Los Angeles, CA 90095 USA

[2] NYU, Courant Inst Math Sci, New York, NY 10012 USA

[3] LLC, HRL Labs, Malibu, CA 90265 USA

来源：

PHYSICAL REVIEW E | 1999年 / 59卷 / 06期

关键词：

D O I：

10.1103/PhysRevE.59.6879

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A kinetic theory is formulated for the velocity of a step edge in epitaxial growth. The formulation involves kinetic, mean-field equations for the density of kinks and "edge adatoms" along the step edge. Equilibrium and kinetic steady states, corresponding to zero and nonzero deposition flux, respectively, are derived for a periodic sequence of step edges. The theoretical results are compared to results from kinetic Monte Carlo (KMC) simulations of a simple solid-on-solid model, and excellent agreement is obtained. This theory provides a starting point for modeling the growth of two-dimensional islands in molecular-beam epitaxy through motion of their boundaries, as an alternative to KMC simulations.

引用

页码：6879 / 6887

页数：9

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