Grain matrix made with excimer-laser crystallization of thin silicon films

被引:5
作者
van der Wilt, PC [1 ]
Ishihara, R [1 ]
机构
[1] Delft Univ Technol, Delft Inst Microelect & Submicron Technol, Lab Elect Components Technol & Mat, NL-2600 GB Delft, Netherlands
关键词
excimer-laser crystallization; location control; thin-film transistor;
D O I
10.4028/www.scientific.net/SSP.67-68.169
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
By applying a method of location control in which heat sinks underlying an amorphous silicon film control the temperature of the film during and after excimer-laser irradiation, a matrix of adjacent grains with a diameter of 2.2 mu m was grown. The influence of several parameters on the yield of location controlled grains has been investigated. It is shown that location control is very sensitive to the laser-irradiation energy density and therefore beam non-uniformities have a devastating effect on the total yield of location-controlled grains. The yield was at best 8% (for an energy density of 643 mJ/cm(2)), but will be increased when beam non-uniformities are absent. Further increase in yield can be achieved by changing shape and material of the heat sink.
引用
收藏
页码:169 / 173
页数:5
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