In situ generation of indium catalysts to grow crystalline silicon nanowires at low temperature on ITO

被引：75

作者：

Alet, Pierre-Jean ^{[1
,2
]}

Yu, Linwei ^{[1
]}

Patriarche, Gilles ^{[3
]}

Palacin, Serge ^{[2
]}

Roca i Cabarrocas, Pere ^{[1
]}

机构：

[1] Ecole Polytech, CNRS, LPICM, F-91128 Palaiseau, France

[2] CEA, IRAMIS, SPCSI, Lab Chem Surfaces & Interfaces, F-91191 Gif Sur Yvette, France

[3] CNRS, Lab Photon & Nanostruct, UPR 20, F-91460 Marcoussis, France

来源：

JOURNAL OF MATERIALS CHEMISTRY | 2008年 / 18卷 / 43期

关键词：

D O I：

10.1039/b813046a

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In situ generation of indium catalyst droplets and subsequent growth of crystalline silicon nanowires on ITO by plasma-enhanced CVD are reported, and the wurtzite (Si-IV) phase is clearly evidenced in some wires.

引用

页码：5187 / 5189

页数：3

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