Solution-derived textured oxide thin films - a review

被引：152

作者：

Bhuiyan, MS ^{[1
]}

Paranthaman, M

Salama, K

机构：

[1] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA

[2] Univ Houston, Houston, TX 77204 USA

来源：

SUPERCONDUCTOR SCIENCE & TECHNOLOGY | 2006年 / 19卷 / 02期

关键词：

D O I：

10.1088/0953-2048/19/2/R01

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin film growth by a non-vacuum deposition technique, namely, the chemical solution deposition (CSD) method, is reviewed with emphasis on the growth of various oxide films and their properties. Various aspects of the solution chemistries for the different routes are discussed, and the effects of solution precursor properties on the conversion of the as-deposited film to the desired phase are also discussed. Crystal structures and functional properties common to many oxide materials are briefly reviewed.

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页码：R1 / R21

页数：21

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