Two-dimensional spatial distributions of sputtered particles produced in a planar magnetron discharge of indium-tin-oxide target

被引：15

作者：

Matsuda, Y ^{[1
]}

Muta, M ^{[1
]}

Fujiyama, H ^{[1
]}

机构：

[1] Nagasaki Univ, Dept Elect & Elect Engn, Nagasaki 8528521, Japan

来源：

THIN SOLID FILMS | 1999年 / 345卷 / 01期

关键词：

indium-tin-oxide; reactive sputtering; planar magnetron; laser induced fluorescence spectroscopy;

D O I：

10.1016/S0040-6090(99)00102-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Spatial distributions of sputtered particles during the de planar magnetron sputtering of indium-tin-oxide (ITO) target in 5 mTorr Ar/O-2 were measured by two-dimensional optical emission spectroscopy (2D-OES) and laser induced fluorescence spectroscopy (2D-LIF). Absolute number density of sputtered in atoms was determined by calibrating the LIF signal with Rayleigh scattering signal from Ar. The flux of atomic species onto the substrate were estimated from the experimental In density and the assumed average velocity of sputtered particles. Comparison between the total flux evaluated from experimental deposition rate and the atomic flux estimated above indicated that the flux of molecular species should exist according to the fractional ratio of introduced O-2 to Ar. Spatial inhomogeneity in film properties such as deposition rate and resistivity and the influence of oxygen partial pressure on them were discussed based on the 2D spatial profiles of sputtered species. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：167 / 171

页数：5

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