Influence of effective surface area on gas sensing properties of WO3 sputtered thin films

被引：148

作者：

Shen, Yanbai ^{[1
]}

Yamazaki, Toshinari ^{[1
]}

Liu, Zhifu ^{[1
]}

Meng, Dan ^{[1
]}

Kikuta, Toshio ^{[1
]}

Nakatani, Noriyuki ^{[1
]}

机构：

[1] Toyama Univ, Fac Engn, Toyama 9308555, Japan

来源：

THIN SOLID FILMS | 2009年 / 517卷 / 06期

关键词：

Tungsten oxide; Thin film; Effective surface area; Gas sensor; NO2; H-2; Sputtering; TIN OXIDE; SENSOR; SENSITIVITY; SNO2; TEMPERATURE; MICROSTRUCTURE; EVAPORATION; COATINGS;

D O I：

10.1016/j.tsf.2008.10.021

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

WO3 thin films having different effective surface areas were deposited Under various discharge gas pressures at room temperature by using reactive magnetron sputtering. The microstructure of WO3 thin films was investigated by X-ray diffraction, scanning electron microscopy, and by the measurement of physical adsorption isotherms. The effective surface area and pore Volume of WO3 thin films increase with increasing discharge gas pressure from 0.4 to 12 Pa. Gas sensors based on WO3 thin films show reversible response to NO2 gas and H-2 gas at an operating temperature of 50-300 degrees C. The peak sensitivity is found at 200 degrees C for NO2 gas and the peak sensitivity appears at 300 degrees C for H-2 gas. For both kinds of detected gases, the sensor sensitivity increases linearly with an increase of effective surface area of WO3 thin films. The results demonstrate the importance of achieving high effective surface area on improving the gas sensing performance. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：2069 / 2072

页数：4

共 24 条

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