CMOS MEMS - Present and future

被引：68

作者：

Baltes, H ^{[1
]}

Brand, O ^{[1
]}

Hierlemann, A ^{[1
]}

Lange, D ^{[1
]}

Hagleitner, C ^{[1
]}

机构：

[1] Swiss Fed Inst Technol, Phys Elect Lab, CH-8093 Zurich, Switzerland

来源：

FIFTEENTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST | 2002年

关键词：

D O I：

10.1109/MEMSYS.2002.984302

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The paper reviews the state-of-the-art in the field of CMOS-based microelectromechanical systems (MEMS). The different CMOS MEMS fabrication approaches, pre-CMOS, intermediate-CMOS, and post-CMOS, are summarized and examples are given. Two microsystems fabricated with post-CMOS micromachining are presented, namely a mass-sensitive chemical sensor for detection of organic volatiles in air and a 10-cantilever force sensor array for application in scanning probe microscopy. The paper finishes with a look into the future, discussing key challenges and future application fields for CMOS MEMS.

引用

页码：459 / 466

页数：8

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