The CVD of nanodiamond materials

被引:263
作者
Butler, James E. [1 ]
Sumant, Anirudha V. [2 ]
机构
[1] USN, Res Lab, GasSurface Dynam Sect, Washington, DC 20375 USA
[2] Argonne Natl Lab, Ctr Nanoscale Mat, Argonne, IL 60439 USA
关键词
growth; nanocrystalline diamond; nucleation; ultra-nanocrystalline diamond;
D O I
10.1002/cvde.200700037
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The growth and characteristics of nanocrystalline diamond thin films with thicknesses from 20 nm to less than 5 mu m are reviewed. These materials contain between 95% and >99.9% diamond crystallites, the balance being made up from other forms of carbon. Within this class of materials there is a continuous range of composition, characteristics, and properties which depend on the nucleation and growth conditions. It is convenient to classify these films as either ultra-nanocrystalline-diamond (UNCD) or nanocrystalline-diamond (NCD) based on their microstructure, properties, and growth environment. In general, UNCD materials are composed of small particles of diamond ca. 2-5 nm in size with sp(2)-carbon bonding between the particles. UNCD is usually grown in argon-rich, hydrogen-poor CVD environments, and may contain up to 95-98% sp(3)-bonded carbon. NCD materials start with high density nucleation, initiating nanometer-sized diamond domains which grow in a columnar manner with the grain size coarsening with thickness. NCD is generally grown in carbon-lean and hydrogen-rich environments. NCD and UNCD exhibit an interesting range of physical properties which find use in X-ray windows and lithography, micro- and nanomechanical and optical resonators, tribological shaft seats and atomic force microscopy (AFM) probes, electron field emitters, platforms for chemical and DNA sensing, and many other applications.
引用
收藏
页码:145 / 160
页数:16
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