Surface diffusion kinetics of GaAs and AlAs metalorganic vapor-phase epitaxy

被引:19
作者
Kasu, M
Kobayashi, N
机构
[1] NTT Basic Research Laboratories, Atsugi, Kanagawa 243-01
关键词
D O I
10.1016/S0022-0248(96)00522-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We have investigated the surface kinetics during metalorganic vapor-phase epitaxy (MOVPE), using high-vacuum scanning tunneling microscopy (STM) observation of two-dimensional (2D) nuclei and denuded zones. Using Monte Carlo simulations based on the solid-on-solid model, from 2D nucleus densities we estimated the surface diffusion coefficients of GaAs and AIAs to be 2 x 10(-6) and 1.5 x 10(-7) cm(2)/s at 530 degrees C, and the energy barriers for migration to be 0.62 and 0.8 eV, respectively. The 2D nucleus size in the [110] direction was about two times larger than that in the [<(1)over bar 10>] direction. The size anisotropy is caused primarily by a difference in the lateral sticking probability (P-s) between steps along the [<(1)over bar 10>] direction (A steps) and steps along the [110] direction (B steps). The P-s ratio was estimated to be more than 3:1. Denuded zone widths on upper terraces were 2 +/- 0.5 times wider than those on lower terraces. This showed that P-s at descending steps was 10 to 3 x 10(2) times larger than P-s at ascending steps.
引用
收藏
页码:246 / 250
页数:5
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