Surface band bending at nominally undoped and Mg-doped InN by Auger electron spectroscopy

被引:37
作者
Cimalla, V
Niebelschütz, M
Ecke, G
Lebedev, V
Ambacher, O
Himmerlich, M
Krischok, S
Schaefer, JA
Lu, H
Schaff, WJ
机构
[1] Tech Univ Ilmenau, Ctr Micro & Nanotechnol, D-98693 Ilmenau, Germany
[2] Tech Univ Ilmenau, Inst Phys, D-98684 Ilmenau, Germany
[3] Cornell Univ, Dept Elect & Comp Engn, Ithaca, NY 14853 USA
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2006年 / 203卷 / 01期
关键词
D O I
10.1002/pssa.200563505
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Non intentionally doped and Mg-doped InN layers were analyzed by sputter depth profiling in an Auger electron spectroscopy (AES) equipment and by Ultra-violet photoelectron spectroscopy (UPS). On the surface of both types of layers a high concentration of oxygen and a strong accumulation of electrons was observed, however, in contrast to the undoped layers the conductivity profile of Mg doped InN shows a strong discontinuity close to the surface. The depth of this discontinuity strongly depends on the oxygen concentration. The energy shift of the In. peak was estimated during the depth profiling in order to obtain information about the position of the Fermi level. In the bulk of the Mg-doped InN the In-MNN peak shift of about 0.15 eV demonstrates the influence of the Mg on the Fermi level, while the surface is clearly n-type. A strong shift of the Fermi level close to the surface was observed, which might be attributed to the formation of In2O3. By the combination of AES and UPS a model for the band bending is proposed, which demonstrates that Mg doping indeed can compensate the n-type conductivity in the bulk and is therefore a prospective candidate to achieve p-type doping in InN. (c) 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:59 / 65
页数:7
相关论文
共 20 条
  • [1] Dependence of the photoreduction and oxidation behavior of indium oxide films on substrate temperature and film thickness
    Bender, M
    Katsarakis, N
    Gagaoudakis, E
    Hourdakis, E
    Douloufakis, E
    Cimalla, V
    Kiriakidis, G
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 90 (10) : 5382 - 5387
  • [2] High-spatial-resolution strain measurements by Auger electron spectroscopy in epitaxial-lateral-overgrowth GaN
    Cai, DJ
    Xu, FC
    Kang, JY
    Gibart, P
    Beaumont, B
    [J]. APPLIED PHYSICS LETTERS, 2005, 86 (21) : 1 - 3
  • [3] CIMALA V, IN PRESS PHYS STAT C
  • [4] Surface conductivity of epitaxial InN
    Cimalla, V
    Ecke, G
    Niebelschütz, M
    Ambacher, O
    Goldhahn, R
    Lu, H
    Schaff, WJ
    [J]. PHYSICA STATUS SOLIDI C - CONFERENCES AND CRITICAL REVIEWS, VOL 2, NO 7, 2005, 2 (07): : 2254 - 2257
  • [5] Correlation between strain, optical and electrical properties of InN grown by MBE
    Cimalla, V
    Förster, C
    Kittler, G
    Cimalla, I
    Kosiba, R
    Ecke, G
    Ambacher, O
    Goldhahn, R
    Shokhovets, S
    Georgakilas, A
    Lu, H
    Schaff, W
    [J]. 5TH INTERNATIONAL CONFERENCE ON NITRIDE SEMICONDUCTORS (ICNS-5), PROCEEDINGS, 2003, 0 (07): : 2818 - 2821
  • [6] CIMALLA V, IN PRESS 6 INT C NIT
  • [7] Davydov VY, 2002, PHYS STATUS SOLIDI B, V229, pR1, DOI 10.1002/1521-3951(200202)229:3<R1::AID-PSSB99991>3.0.CO
  • [8] 2-O
  • [9] Resonant localized donor state above the conduction band minimum in InN
    Dmowski, LH
    Plesiewicz, JA
    Suski, T
    Lu, H
    Schaff, W
    Kurouchi, M
    Nanishi, Y
    Konczewicz, L
    Cimalla, V
    Ambacher, O
    [J]. APPLIED PHYSICS LETTERS, 2005, 86 (26) : 1 - 3
  • [10] ECKE G, 2005, EUR C APPL SURF INT