Comparison study of tunneling models for Schottky field effect transistors and the effect of Schottky barrier lowering

被引:38
作者
Vega, Reinaldo A. [1 ]
机构
[1] Rochester Inst Technol, Microelect Engn Dept, Rochester, NY 14623 USA
[2] Biophan Technol Inc, Rochester, NY 14623 USA
关键词
Airy function; ambipolar; metallic source/drain (S/D); nanotechnology; Schottky barrier; semiconductor device modeling; tunneling model; Wentzel-Kramers-Brillouin (WKB) method;
D O I
10.1109/TED.2006.876261
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An Airy function transfer matrix tunneling model and the Wentzel-Kramers-Brillouin (WKB) tunneling model have been compared in the application to Schottky field effect transistors (SFETs) with and without the incorporation of Schottky barrier lowering (SBL). Model calculations have shown that the WKB model can predict tunneling current through a Schottky barrier with reasonable accuracy when SBL is excluded. It is also shown that the WKB model can mimic the total current behavior in an SFET when SBL is included and when thermal current is excluded. In both cases, though, the actual physical behavior of the SFET is misrepresented, and so it is finally shown that in the design cases of interest (low Schottky barrier heights), thermal current dominates the total ON-state current in SFETs.
引用
收藏
页码:1593 / 1600
页数:8
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