共 18 条
[2]
Inoue K, 1995, INTERNATIONAL ELECTRON DEVICES MEETING, 1995 - IEDM TECHNICAL DIGEST, P445, DOI 10.1109/IEDM.1995.499234
[3]
A 25-nm-long channel metal-gate p-type Schottky source/drain metal-oxide-semiconductor field effect transistor on separation-by-implanted-oxygen substrate
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
2000, 39 (08)
:4757-4758
[4]
Jang M, 2002, ETRI J, V24, P455, DOI 10.4218/etrij.02.0102.0006
[6]
Complementary silicide source/drain thin-body MOSFETs for the 20nm gate length regime
[J].
INTERNATIONAL ELECTRON DEVICES MEETING 2000, TECHNICAL DIGEST,
2000,
:57-60
[8]
REZVANI GA, 1998, IEEE INT C MICR TEST, V11, P45
[9]
New complimentary metal-oxide semiconductor technology with self-aligned Schottky source/drain and low-resistance T gates
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1997, 15 (06)
:2795-2798
[10]
Analysis of short-channel Schottky source/drain metal-oxide-semiconductor field-effect transistor on silicon-on-insulator substrate and demonstration of sub-50-nm n-type devices with metal gate
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
1999, 38 (11)
:6226-6231