Erbium silicided n-type Schottky barrier tunnel transistors for nanometer regime applications

被引:12
作者
Jang, M [1 ]
Lee, S
Park, K
机构
[1] Elect & Telecommun Res Inst, Semicond & Basic Res Lab, Nanoelect Device Team, Taejon 305350, South Korea
[2] Seoul Natl Univ, Nano Sci & Technol Dept, Seoul 130743, South Korea
关键词
drain-induced Schottky barrier thinning; erbium silicide; modeling; Schottky barrier tunnel transistors;
D O I
10.1109/TNANO.2003.820801
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The theoretical and experimental current-voltage characteristics of Erbium silicided n-type Schottky barrier tunneling transistors (SBTTs) are discussed. The theoretical drain current to drain voltage characteristics show good correspondence with the experimental results in 10-mum-long channel n-type SBTTs. From these results, the extracted Schottky barrier height is 0.24 eV. The experimentally manufactured n-type SBTTs with 60-nm gate lengths show typical transistor behaviors in drain current to drain voltage characteristics. The drain current on/off ratio is about 10(5) at low-drain voltage regime in drain current to gate voltage characteristics. However, the on/off ratio tends to decrease as the drain voltage increases. From the numerical simulation results, the increase of off-current is mainly attributed to the thermionic current and the. increase of drain current is mainly attributed to the tunneling current.
引用
收藏
页码:205 / 209
页数:5
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