Simultaneous extraction of recoverable and permanent components contributing to bias-temperature instability

被引:120
作者
Grasser, T. [1 ]
Kaczer, B. [2 ]
Hehenberger, R. [1 ]
Goes, W. [1 ]
O'Connor, R. [2 ]
Reisinger, H. [3 ]
Gustin, W. [3 ]
Schluender, C. [3 ]
机构
[1] TU Wien, Christian Doppler Lab TCAD, Inst Microelect, A-1040 Vienna, Austria
[2] IMEC, B-3001 Heverlee, Belgium
[3] Infineon Technol, Corp Reliabil Methodol, Munich, Germany
来源
2007 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, VOLS 1 AND 2 | 2007年
关键词
D O I
10.1109/IEDM.2007.4419069
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Measuring the degradation of modern devices subjected to bias temperature stress has turned out to be a formidable challenge. Interestingly, measurement techniques such as fast-V-th, on-the-fly I-D,I-lin, and charge-pumping give quite different results. This has often been explained by the inherent recovery in non-on-the-fly techniques. Still, all these techniques deliver important information on the degradation and recovery behavior and a rigorous understanding linking these results is still missing. Based on our detailed studies of the recovery, we propose a new measurement technique which allows the simultaneous extraction of two distinctly different components, a fast universally recovering component and a slow, nearly permanent component.
引用
收藏
页码:801 / +
页数:3
相关论文
共 13 条
[1]  
[Anonymous], 2006, IEDM
[2]   Paradigm shift for NBTI characterization in ultra-scaled CMOS technologies [J].
Denais, M. ;
Bravaix, A. ;
Huard, V. ;
Parthasarathy, C. ;
Guerin, C. ;
Ribes, G. ;
Perrier, F. ;
Mairy, M. ;
Roy, D. .
2006 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 44TH ANNUAL, 2006, :735-+
[3]   On-the-fly characterization of NBTI in ultra-thin gate oxide PMOSFET's [J].
Denais, M ;
Bravaix, A ;
Huard, V ;
Parthasarathy, C ;
Ribes, G ;
Perrier, F ;
Rey-Tauriac, Y ;
Revil, N .
IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST, 2004, :109-112
[4]  
FERNANDEZ R, 2006, IEDM, P1
[5]   The universality of NBTI relaxation and its implications for modeling and characterization [J].
Grasser, Tibor ;
Goes, Wolfgang ;
Sverdlov, Victor ;
Kaczer, Ben .
2007 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 45TH ANNUAL, 2007, :268-+
[6]   Negative bias temperature instability: Recoverable versus permanent degradation [J].
Grasser, Tibor ;
Kaczer, Ben .
ESSDERC 2007: PROCEEDINGS OF THE 37TH EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE, 2007, :127-+
[7]   Understanding SRAM high-temperature-operating-life NBTI: Statistics and permanent vs recoverable damage [J].
Haggag, A. ;
Anderson, G. ;
Parihar, S. ;
Burnett, D. ;
Abeln, G. ;
Higman, J. ;
Moosa, M. .
2007 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 45TH ANNUAL, 2007, :452-+
[8]   NBTI degradation: From physical mechanisms to modelling [J].
Huard, V ;
Denais, M ;
Parthasarathy, C .
MICROELECTRONICS RELIABILITY, 2006, 46 (01) :1-23
[9]   Disorder-controlled-kinetics model for negative bias temperature instability and its experimental verification [J].
Kaczer, B ;
Arkhipov, V ;
Degraeve, R ;
Collaert, N ;
Groeseneken, G ;
Goodwin, M .
2005 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 43RD ANNUAL, 2005, :381-387
[10]  
Mahapatra S, 2007, INT RELIAB PHY SYM, P1